发明名称 SEMICONDUCTOR CHIP AND WIRING BASE BOARD AND MANUFACTURING METHOD OF THEM, SEMICONDUCTOR WAFER, SEMICONDUCTOR DEVICE, CIRCUIT BASE BOARD AND ELECTRONIC INSTRUMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To form a bump capable of preventing the infiltration of moisture into a primary coat for a semiconductor chip and a wiring base board, and to provide the manufacturing method of them, a semiconductor wafer, a semiconductor device, a circuit base board and an electronic instrument. <P>SOLUTION: A plurality of pads 12 are electrically connected to an integrated circuit. A passivation film 14 covers a part of the pads 12 and exposes the other part of them. A bump 30 is formed in the pad 12. The bump 30 is a single layer, disposed on the part of the pad 12, which is exposed extending from the passivation film 14 to the passivation film 14. <P>COPYRIGHT: (C)2003,JPO</p>
申请公布号 JP2003203940(A) 申请公布日期 2003.07.18
申请号 JP20020250773 申请日期 2002.08.29
申请人 SEIKO EPSON CORP 发明人 OBARA HIROSHI
分类号 H01L21/60;H01L23/31;H01L23/485;H05K3/28;H05K3/40;(IPC1-7):H01L21/60 主分类号 H01L21/60
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