摘要 |
<p><P>PROBLEM TO BE SOLVED: To form a bump capable of preventing the infiltration of moisture into a primary coat for a semiconductor chip and a wiring base board, and to provide the manufacturing method of them, a semiconductor wafer, a semiconductor device, a circuit base board and an electronic instrument. <P>SOLUTION: A plurality of pads 12 are electrically connected to an integrated circuit. A passivation film 14 covers a part of the pads 12 and exposes the other part of them. A bump 30 is formed in the pad 12. The bump 30 is a single layer, disposed on the part of the pad 12, which is exposed extending from the passivation film 14 to the passivation film 14. <P>COPYRIGHT: (C)2003,JPO</p> |