发明名称 FLASH MEMORY PROVIDED WITH TRENCH SOURCE LINE
摘要 PROBLEM TO BE SOLVED: To provide a flash memory wherein trench source lines are installed, an interference is not generated when programing is performed, a current is not decreased when reading is performed, and prescribed conductivity can be maintained. SOLUTION: This flash memory is provided with a substrate in which trenches are formed, doping trench source lines formed in regions on bottom surfaces of the trenches, and insulating materials formed in the trenches. A first dielectric layer, a first conducting layer, a second dielectric layer and a second conducting layer which are formed on the substrate are formed in order. The first conducting layer is made to be a floating gate, and the second conducting layer is made to be a control gate. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003197780(A) 申请公布日期 2003.07.11
申请号 JP20010396687 申请日期 2001.12.27
申请人 EMEMORY TECHNOLOGY INC 发明人 CHIN FUKUGEN;JO SEISHO;KIN GAKIN;YO SEISHO;SHU SHUFUN;RI KONKO;GO MOEKI
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 主分类号 H01L21/8247
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