| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an electrooptic device where a light reflecting film with a light scattering function can be formed in a favorable state while a rise in manufacturing cost is minimized and to provide electronic equipment equipped with the same. <P>SOLUTION: On a TFT array substrate 10 of the reflection type electrooptic device 100, an unevenness formation layer 6g in the same layer the a data line 6a is formed in a specified pattern below a light reflecting film 8a and a photosensitive resin layer 7a is formed of photosensitive resin 7 above it by half-exposure through an exposure mask 200, development, and heating. This photosensitive resin layer 7a is thick in the formation area of the unevenness formation layer 6a and thin in a non-formation area of the unevenness formation layer 6g, and has a smooth surface shape. An edge-less uneven pattern 8g in a smooth shape may be given to the surface of the light reflecting film 8a. <P>COPYRIGHT: (C)2003,JPO |
