| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive chemical amplification type resist composition having favorable various kinds of resist performances such as sensitivity and resolution and particularly excellent in durability for an SEM and dry etching durability. <P>SOLUTION: The chemical amplification type positive resist composition contains a resin having at least one kind of polymerization unit selected from the group consisting of polymerization units expressed by formulae (Ia) and (Ib), the resin itself insoluble or hardly soluble with an alkali aqueous solution but converted into soluble with an alkali aqueous solution by the effect of an acid, and an acid generator and a polyfunctionl epoxy compound. In the formulae, each of R<SB>1</SB>, R<SB>2</SB>, R<SB>3</SB>and R<SB>4</SB>independently represents hydrogen atom or methyl group and n represents an integer from 1 to 3. When there are a plurality of R<SB>2</SB>, they may be mutually the same or different, and when there are a plurality of R<SB>4</SB>, they may be mutually the same or different. <P>COPYRIGHT: (C)2003,JPO |
