发明名称 Lithographic apparatus and integrated circuit device manufacturing method
摘要 A microphone or other acoustic sensor is used to detect sound or other vibrations caused by the passage of pulses of radiation of a projection beam. The measured vibrations may be used to determine the intensity of the projection beam or the presence of contaminants. The vibrations are caused by absorption of the beam pulses in an absorptive gas or by objects, e.g. the substrate or mirrors in the projection lens, on which the projection beam is incident. <IMAGE>
申请公布号 EP1321824(A3) 申请公布日期 2003.07.02
申请号 EP20030005671 申请日期 2001.11.22
申请人 ASML NETHERLANDS B.V. 发明人 VAN DER VEEN, PAUL
分类号 G03F7/20 主分类号 G03F7/20
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