发明名称 Method for determining a preceding wafer group
摘要 In the method for determining a preceding wafer, at least one semiconductor wafer is determined as a preceding wafer among a plurality of semiconductor wafers constituting one lot. The preceding wafer is then subjected to a given process among a plurality of processes for fabrication of a semiconductor device. The determination of the preceding wafer is based on processing results of an upstream process among the plurality of processes performed for the plurality of semiconductor wafers prior to the given process. After examination of processing results of the given process on the preceding wafer, the given process is performed for the plurality of semiconductor wafers other than the preceding wafer.
申请公布号 US6586261(B1) 申请公布日期 2003.07.01
申请号 US20000649573 申请日期 2000.08.29
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 ISHIZUKA HIROAKI;MATSUMOTO SHIGERU
分类号 H01L21/02;H01L21/00;(IPC1-7):H01L21/00 主分类号 H01L21/02
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