METHOD OF FABRICATING SILICA LAYER FOR OPTICAL WAVEGUIDE

摘要

PURPOSE: A method of fabricating a silica layer for optical waveguide is provided to perform rapidly an ionization process of a reaction gas and enhance a depositing ratio of the silica layer by using a high density plasma CVD(Chemical Vapor Deposition) method. CONSTITUTION: A chamber including a magnetic induction coil, a gas supply portion, and a support plate is prepared. A substrate is loaded on the support plate. A reaction gas is injected into the inside of the chamber. A silica layer is deposited by using a high density plasma CVD method. The high density plasma CVD method is one of ICP(Inductively Coupled Plasma), CVD, and TCP(Transfer Coupled Plasma) CVD. An optical waveguide is formed by mixing silica with polymer on the substrate. The polymer is formed by a spin coating method.