| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a high sensitivity chemically amplified positive resist composition capable of efficiently forming an ultrafine resist pattern faithful to a mask pattern and having a good section shape. <P>SOLUTION: The chemically amplified positive resist composition comprises (A) a copolymer resin component comprising 50-85 mol% hydroxyl-containing styrene units, 15-35 mol% styrene units and 2-20 mol% acrylic or methacrylic ester units having a dissolution inhibiting group which can be released by an acid, (B) a photoacid generator comprising an onium salt containing a fluoromethylsulfonate ion as an anion and (C) a tertiary alkanolamine. <P>COPYRIGHT: (C)2003,JPO |
