发明名称 DEVICE-MANUFACTURE RELATED DEVICE, INERT GAS REPLACEMENT METHOD, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To minimize the deformation and the like of a pellicle frame when an inert gas supply part is put close to the pellicle frame to supply an inert gas into a pellicle space. <P>SOLUTION: On a reticle support base 28, a reticle 23 with a pellicle is movably mounted and then the inert gas supply part 29 and an inert gas discharge part 37 are driven so as to sandwich the pellicle frame 25 to position the pellicle frame 25 and also bring the inert gas supply part 29 and inert gas discharge part 37 into contact with the pellicle frame 25. In this state, the inert gas is supplied from the inert gas supply part 29 into the pellicle space through an air vent 27 of the pellicle frame 25 and discharged to the inert gas discharge part 37 through an air vent 27 provided on the opposite side. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003167328(A) 申请公布日期 2003.06.13
申请号 JP20010370352 申请日期 2001.12.04
申请人 CANON INC 发明人 KAMONO TAKASHI
分类号 G03F1/64;G03F7/20;H01L21/027 主分类号 G03F1/64
代理机构 代理人
主权项
地址