| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an excellent positive resist composition that is excellent in line edge roughness, prevents a pattern falling and does not cause the pattern falling even if a focus and exposure particularly in a fine pattern are varied. <P>SOLUTION: The positive resist composition is characterized in containing (A) a compound capable of generating an acid upon irradiation with an actinic ray or a radiation, (B) a resin that is insoluble or slightly soluble in alkalis but becomes alkali-soluble under an action of an acid, (C) a basic compound and (D) a compound having at least three hydroxyl groups or at least three substituted hydroxyl groups and having at least one cyclic structure. <P>COPYRIGHT: (C)2003,JPO |
