发明名称 Super self -aligned heterojunction biplar transistor and its manufacturing method
摘要 A super self-aligned heterojunction bipolar semiconductor device and its manufacturing method are disclosed. The present invention provides a super self-aligned heterojunction bipolar transistor that may maintain the operational stability and the uniformity of a device, facilitate the manufacturing process, and reduce manufacturing time by employing a highly concentrated thick polysilicon film; and its manufacturing method. Also, the present invention provides a super self-aligned heterojunction bipolar transistor that may reduce noise by making the base resistance reduced by a highly concentrated thick polysilicon film, and may minimize the parasitic capacitance between a collector and a base and between a base and an emitter, and the parasitic resistance of a base, so as to realize high-speed operation of a device; and its manufacturing method.
申请公布号 US2003107051(A1) 申请公布日期 2003.06.12
申请号 US20020294046 申请日期 2002.11.14
申请人 PARK SOO GYUN;LEE YOUNG HO;SEO KANG HOON;CHOI JIN SUNG;RHO YOUNG HWA 发明人 PARK SOO GYUN;LEE YOUNG HO;SEO KANG HOON;CHOI JIN SUNG;RHO YOUNG HWA
分类号 H01L21/331;H01L29/737;H01L31/0328;H01L31/0336;H01L31/072;H01L31/109;(IPC1-7):H01L31/032;H01L31/033 主分类号 H01L21/331
代理机构 代理人
主权项
地址