| 摘要 |
An exposure equipment which is simply configured and can expose fine cyclic patterns whose pitch is smaller than the wavelength of light source has the laser beam 2 (wavelength lambda ) outgoing from the light source 1 as shown in FIG. 5 reflected on the mirror 3a, 3b, guided to the beam expander optical system 4, and converged by a focusing lens 4a, passing through a pinhole 4c located on the focal plane of the focusing lens 4a, and converted into parallel beam 5 with the beam diameter expanded by a collimator lens 4b, wherein this parallel beam 5 vertically impinges on and penetrates a phase shifter 6 with recessed portion and protruded portion repeatedly formed on the outgoing surface side of the parallel flat plate configured with transparent material of refraction index n, and as a result, +/- first order diffracted light is generated, and the +/- first order diffracted lights interfere with one another on the sensitized film facing the phase shifter via a spacer 7 to form fine fringes, thereby exposing the sensitized film. <IMAGE> |
