| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a Mg-containing ITO sputtering target which consists of substantially In, Sn, Mg and O, and can restrain arcing. <P>SOLUTION: The sputtering target is composed of a sintered body substantially consisting of In, Sn, Mg and O, which compacts a mixture of powders of indium oxide and tin oxide, and powders of magnesium indate and/or magnesium stanate, or a mixture of a composite oxide powder of indium oxide-tin oxide, and powders of magnesium indate and/or magnesium stanate, and then sintering the compact. <P>COPYRIGHT: (C)2003,JPO |
