发明名称 ULTRAVIOLET IRRADIATION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an ultraviolet irradiation apparatus capable of uniformizing the concentration of oxygen between a light irradiation part and a treated substrate to uniformly treat the surface of a large-sized substrate. SOLUTION: A plurality of rod-shaped lamps 11a are opposed to the surface of a substrate W to be arranged parallelly to each other with a predetermined pitch and the substrate W is irradiated with ultraviolet rays from the lamps 11a. A gas introducing port 13 and/or an exhaust port 14 comprising an opening provided along the tube axis of the rod-shaped lamps 11a is provided between the adjacent rod-shaped lamps 11a. The light irradiation part 11 is relatively moved in the direction parallel to the substrate W and crossing the tube axes of the lamps 11a at a right angle by a drive mechanism 24 and the whole of the substrate W is irradiated with ultraviolet rays while supplying air or oxygen and active oxygen is generated to decompose the organic matter on the substrate W. Further, by changing the pressure distribution of the supplied gas in the longitudinal direction of the lamps or changing the moving speed of the light irradiation part 11, still more uniform treatment can be performed. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003159571(A) 申请公布日期 2003.06.03
申请号 JP20010360399 申请日期 2001.11.27
申请人 USHIO INC 发明人 SUZUKI SHINJI
分类号 G21K5/00;B08B7/00;G02F1/13;G02F1/1333;G21K5/10;H01L21/304;(IPC1-7):B08B7/00;G02F1/133 主分类号 G21K5/00
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