发明名称 Nonvolatile semiconductor memory device
摘要 Disclosed is a nonvolatile semiconductor memory device in which a disturbance phenomenon can be prevented. A nonvolatile semiconductor memory device has a semiconductor substrate, and a floating gate electrode formed on the semiconductor substrate via a gate insulating film. The floating gate electrode includes a lower conductive layer formed on the gate insulating film and having a first width W1 in a channel width direction, and an upper conductive layer formed on the lower conductive layer and having a second width W2 wider than the first width W1 in the channel width direction.
申请公布号 US2003098485(A1) 申请公布日期 2003.05.29
申请号 US20020153738 申请日期 2002.05.24
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 NAKATANI YASUO
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L29/788 主分类号 H01L21/8247
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