发明名称 |
Nonvolatile semiconductor memory device |
摘要 |
Disclosed is a nonvolatile semiconductor memory device in which a disturbance phenomenon can be prevented. A nonvolatile semiconductor memory device has a semiconductor substrate, and a floating gate electrode formed on the semiconductor substrate via a gate insulating film. The floating gate electrode includes a lower conductive layer formed on the gate insulating film and having a first width W1 in a channel width direction, and an upper conductive layer formed on the lower conductive layer and having a second width W2 wider than the first width W1 in the channel width direction.
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申请公布号 |
US2003098485(A1) |
申请公布日期 |
2003.05.29 |
申请号 |
US20020153738 |
申请日期 |
2002.05.24 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
NAKATANI YASUO |
分类号 |
H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L29/788 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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