Einrichtung zur Erzeugung eines lokalen Elektron-Zyklotron-Mikrowellen-Niederdruckplasma an einem vorgebbaren Ort innerhalb der Prozeßkammer der Einrichtung

摘要

The invention relates to a system for generating a local electron-cyclotron microwave low-pressure plasma at a predetermined location within the processing chamber of said system. Said system comprises a microwave transmitter device (MAV), provided with a microwave reflector and a plasma positioning unit (PLE), the magnetic field of which, extending in the open, crosses the reflected microwave beam. The microwave decoupling is targeted on a conical concave reflector and located at the focal point of the reflecting surface. Said surface is parabolic, can also be ellipsoidal or hyperboloidal and covers the focal point. In any case, the path of the reflected microwave beam is parallel or at least approximately parallel. A substrate, which is exposed on a substrate support, is located on the reflected microwave beam path. A system, for generating a magnetic field, can be displaced as desired along the axis of the reflected microwave beam, such that the convex magnetic field, extending in the open, forms a crossing volume with the microwave beam, in which a condition for the electron cyclotron resonance can be established according to the magnetic field intensity, the microwave frequency and the gas density. By displacing said magnetic field, the substrate can be brought into the vicinity of the plasma or entirely immersed therein.