发明名称 APPARATUS FOR TREATING WASTEWATER CONTAINING GALLIUM
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for treating wastewater containing gallium which can completely and efficiently recover the gallium, a valuable rare element, by treating the wastewater discharged from a compound-semiconductor wafer production factory, a device production factory, etc. SOLUTION: The apparatus has a plurality of gallium adsorption means connected in series. After the wastewater containing gallium is passed through the means connected in series, the means of the first step is separated, and a new gallium adsorption means is connected to the means of the last step.
申请公布号 JP2003154358(A) 申请公布日期 2003.05.27
申请号 JP20010357804 申请日期 2001.11.22
申请人 KURITA WATER IND LTD 发明人 MATSUMOTO AKIRA;HAYASHI KAZUKI
分类号 B01D15/00;C02F1/28;(IPC1-7):C02F1/28 主分类号 B01D15/00
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