Illumination system with a plurality of light sources

摘要

The invention concerns an illumination system for wavelengths<193 nm, especially for EUV-lithography witha plurality of light sourcesa mirror device for creating secondary light sources comprising several mirrors, said mirrors are comprising raster elements.The invention is characterized in thatthe plurality of light sources are coupled together in order to illuminate the exit pupil of the illumination system up to a predetermined degree of filling.