发明名称 IMAGE SENSOR AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: An image sensor and a method for manufacturing the same are provided to improve photo sensitivity by minimizing the difference of focusing point between the major axis and minor axis of a microlens. CONSTITUTION: In an image sensor having a non-square pixel, a microlens(30) includes the first microlens(30A) having a lower part of non-square and the second microlenses(30B) having a lower part of square. A focusing point compensation layer(26A) is formed in a planarization layer(28) so as to compensate focusing point. A light receiving element(22) is formed in a semiconductor substrate(20).
申请公布号 KR20030037868(A) 申请公布日期 2003.05.16
申请号 KR20010068960 申请日期 2001.11.06
申请人 HYNIX SEMICONDUCTOR INC. 发明人 KWON, GYEONG GUK
分类号 H01L27/146;(IPC1-7):H01L27/146 主分类号 H01L27/146
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