| 摘要 |
PROBLEM TO BE SOLVED: To measure inclination and flexure of reticle or the like, depending on the shape of plane of the original one and to perform, on the stage, compensation for effectively removing the influences due to these inclination and flexure with high accuracy. SOLUTION: The exposing apparatus comprises a reticle scan stage 1, which moves while a reticle 7 is placed thereon, as a first object and a wafer stage 4 which moves, while a wafer 3 is placed thereon as a second object. The stage 1 and stage 4 are scanned synchronously to a projection optical system 2, and a pattern on the reticle 7 is projected on the wafer via the projection optical system 2. In addition, TTR scopes 8 as object-observing means for observing the reticle 7 and wafer 3 are also provided. This scope 8 has the function of detecting the position of the observed image and the function to focus the image to the observed reticle 7. A fixed relation exists between the focusing position and the position, in an XY direction of the observed mark. |
