发明名称 SYNDIOTACTIC SUBSTITUTED HYDROXYSTYRENE-BASED POLYMER AND PHOTOSENSITIVE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a highly syndiotactic structure-having substituted hydroxystyrene-based polymer which overcomes the imbalance of various proper ties such as heat resistance, sensitivity and resolution, and to provide a photosen sitive composition using the polymer. SOLUTION: This syndiotactic substituted hydroxystyrene-based polymer which is represented by the general formula (1) [X is a photodegradable photosensitive group; and (m):(n) is a molar ratio of 0.1 to 0.9:0.9 to 0.1] and in which the hydroxyl groups are partially substituted with photodegradable photosensitive groups, is characterized in that the tacticity of the C1 carbon of the phenyl group has a racemi pentad of >=30% measured by<13> C-NMR. A photosensitive composition containing the polymer.
申请公布号 JP2003137935(A) 申请公布日期 2003.05.14
申请号 JP20010336769 申请日期 2001.11.01
申请人 NIPPON STEEL CHEM CO LTD 发明人 KAWABE MASANAO
分类号 G03F7/023;C08F212/14 主分类号 G03F7/023
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