发明名称 STAGE APPARATUS AND EXPOSURE APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To improve the position controllability of a stage body by eliminating an effect of a reaction force brought by movement even when the stage body moves in a plurality of directions. SOLUTION: First and second stators are disposed such that the first stator is moved by a reaction force caused by movements of the stage bodies 14A and 14B in a first direction, and the first and second stators are moved by a reaction force caused by the movements of the stage bodies 14A and 14B in a second direction.</p>
申请公布号 JP2003133204(A) 申请公布日期 2003.05.09
申请号 JP20010325416 申请日期 2001.10.23
申请人 NIKON CORP 发明人 TANAKA KEIICHI
分类号 G12B5/00;H01L21/027;H01L21/68;(IPC1-7):H01L21/027 主分类号 G12B5/00
代理机构 代理人
主权项
地址