| 摘要 |
PURPOSE: Provided are water-soluble polyurethane for chemical mechanical polishing pad, and a method for producing the same, which can omit a foaming step for forming a pore structure of pad, and a conditioning step that is an essential step to ensure a desired abrasion in chemical mechanical polishing process but involves a plurality of problems. CONSTITUTION: The polyurethane comprises 65-85 wt% of polyester polyol, 10-25 wt% of isocyanate, 0-10 wt% of low molecular weight diol, 1.5-10 wt% of ionic acid compound, and a corresponding amount of neutralizer to 70-140 moles of the ionic acidic radical of the ionic acid compound. The polyester polyol is at least one compound selected from the group consisting of poly(ethylene adipate)diol(PEAD), poly(tetramethylene adipate)diol(PTAD), and poly(hexamethylene adipate)diol(PHAD), and isocyanate is at least one compound selected from the group consisting of 4,4'-diphenyl methane diisocyanate(MDI), hexamethylene diisocyanate(HDI), isophorone diisocyanate(IPDI), and toluene diisocyanate(TDI).
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