APPARATUS FOR VACUUM DEPOSITION, SPECIFICALLY FOR METALLIZING PLASTIC FILM

摘要

The apparatus comprise a vacuum chamber (3) inside which a feeding device of the substrate (F) and a bank (25) of vaporization sources are arranged. The substrate feeding device can be extracted from the vacuum chamber. Conversely, the vaporization source bank can be raised from a lower vaporization position to a higher maintenance position without needing to be extracted from said vacuum chamber.