Method for forming a thin film and a thin film forming apparatus therefor

摘要

A method for forming a thin film comprises the steps of: forming a first thin film using a raw material which comprises an adduct of metal beta-diketonate and adduct-forming material by a metal organic chemical vapor deposition (MOCVD) method; associating metal beta-diketonate dissociated from the adduct in the raw material with an adduct-forming material to regenerate the raw material; and forming a second thin film using the regenerated raw material by the MOCVD method.