| 摘要 |
PROBLEM TO BE SOLVED: To form a barrier of desired line pattern without making defects at the vicinity of the end portion in forming a barrier by sandblast method. SOLUTION: In patterning the barrier material layer through a masking layer by sandblast process, the pattern in the vicinity of the end portion A in the masking layer 3 is made so that the masking layer 3 having an extended portion is put adjacent to the masking layer 3 having no extended portion and that the extended portion of that adjoining masking layer 3 is positioned on the extension line of the masking layer 3 having no extended portion. Since the flow of mixed air containing the grinding material is blocked at the extended portion, the barrier material layer in the vicinity of the end portion A of the masking layer 3 is not excessively ground, and the masking layer 3 is not removed from the end portion A during the course of the process. At the removal process of the masking layer 3 in the later process, the extended portion is removed simultaneously, and no extra time is necessary for removal.
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