| 摘要 |
PROBLEM TO BE SOLVED: To provide an etchant in which an etching residue is not generated at all when a transparent conductive film undergoes wet etching and the wet etching can be conducted under gentle conditions while suppressing bubbling. SOLUTION: An aqueous solution containing oxalic acid, a surfactant of polyoxyalkylene alkylether sulfate and/or polyoxyalkylene alkylphenylether sulfate, and at least one kind selected from a group of polyoxyalkylene monoalkylether, polyoxyalkylene block polymer, polyoxyalkylene fatty acid ester and polyoxyalkylene denatured silicon oil is employed as an etchant.
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