PCVD-VORRICHTUNG UND VERFAHREN ZUR HERSTELLUNG EINER OPTISCHEN FASER, EINES VORFORM-STABES UND EINES MANTELROHRES UND DIE DAMIT HERGESTELLTE OPTISCHE FASER

摘要

The invention relates to an apparatus for performing Plasma Chemical Vapor Deposition (PCVD), whereby one or more layers of silica can be deposited on an elongated vitreous substrate, the apparatus comprising an elongated microwave guide which emerges into a resonant cavity which is substantially cylindrically symmetric about a cylindrical axis, along which axis the substrate can be positioned, in which apparatus:the cavity is substantially annular in form, with an inner cylindrical wall and an outer cylindrical wall;the inner cylindrical wall comprises a slit which extends in a full circle around the cylindrical axis;the guide has a longitudinal axis which is substantially perpendicular to the cylindrical axis and which does not intercept the slit.The invention also relates to a method of manufacturing an optical fiber, a preform rod and a jacket tube using said apparatus as well as to the thus obtained optical fiber.