| 摘要 |
An apparatus and method for imaging and scanning masks for semiconductor production includes placing a scanning instrument having a probe at a position to scan a layer side of a mask with the probe, placing an optical microscope on a side of the mask opposite the layer side at a position to image a detail of the mask from the side of the mask opposite the layer side, positioning the scanning instrument and the optical microscope relative to each other such that the optical microscope images the probe and the mask simultaneously, and laterally displacing the mask between and relative to the scanning instrument and the optical microscope to permit selection of an imaged detail of the mask while a relative position between the scanning instrument and the optical microscope is maintained. A selected detail of the mask is imaged and/or scanned.
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