发明名称 METHOD AND APPARATUS FOR FORMING MULTI-ELEMENT THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a multi-element thin film, which can accurately and efficiently manufacture a desired thin film having a film composition desired for the multi-element thin film on a substrate, and provide an apparatus. SOLUTION: The method for forming the multi-element thin film, which applies an electric power to both a substrate electrode holder 9 mounting a substrate 8 and sputtering electrodes 4a-4d in which a target 3 is arranged, while supplying gas into a vacuum chamber 2 along with exhausting it, and keeping the inside of the vacuum chamber 2 to a predetermined pressure, and treats the substrate 8 while rotating the substrate electrode holder 9, the target 3 comprises several targets each of which consists of compounds or mixtures having different compositions or composition ratios, and by adjusting the electric power applied to both the substrate electrode holder 9 and the sputtering electrodes 4a-4d, independently on each target 3.
申请公布号 JP2003113467(A) 申请公布日期 2003.04.18
申请号 JP20010309901 申请日期 2001.10.05
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 YAMANISHI HITOSHI;ADACHI HIROSHI;MURAOKA SHUNSAKU
分类号 C23C14/34;G11B5/851;H01F41/18;H01F41/30;(IPC1-7):C23C14/34 主分类号 C23C14/34
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