发明名称 |
METHODS AND APPARATUS FOR DEFECT LOCALIZATION |
摘要 |
The present invention includes a system for localization of defects in test samples. A sample is scanned using a particle beam. Some particles interact with conductive elements and may cause the emission of x-rays. Other particles can pass through the sample entirely and generate a current that can be measured. A higher current generated indicates less conductive material at the scan target that may mean a void, dishing, or erosion is present. Localization of a defect can be confirmed using an x-ray emission detector.
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申请公布号 |
WO03030206(A1) |
申请公布日期 |
2003.04.10 |
申请号 |
WO2002US31517 |
申请日期 |
2002.10.01 |
申请人 |
KLA-TENCOR TECHNOLOGIES CORPORATION |
发明人 |
NASSER-GHODSI, MEHRAN;REICHERT, JEFFREY |
分类号 |
H01L21/66;G01N23/225;H01J37/244;H01J37/26;H01J37/28;(IPC1-7):H01J37/28;G01N23/223 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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