| 摘要 |
PROBLEM TO BE SOLVED: To provide a negative resist composition for electron beams or X-rays having sufficient characteristics of sensitivity, resolution and resist profile with respect to the use of electron beams or X-rays. SOLUTION: The negative resist composition for electron beams or X-rays contains (A) a compound which generates an acid by irradiation of electron beams or X-rays, (B) a crosslinking agent which crosslinks by an acid, and (C) an alkali-soluble resin having a specified repeating unit. |
