发明名称 WASTE GAS TREATMENT DEVICE AND WASTE GAS TREATMENT METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a waste gas treatment device and a waste gas treatment method capable of quickly diffusing upward the gas subjected to depolluting treatment. SOLUTION: The waste gas treatment device 1 is constituted by providing scrubbers 2, 3 and 4 for releasing the gas subjected to the depolluting treatment after subjecting the waste gas consisting essentially of gaseous hydrogen. An air flow forming device 10 for forming the air flow heading for upward is provided around the gas releasing parts 2a, 3a and 4a of the scrubbers 2a, 3a and 4a.</p>
申请公布号 JP2003103138(A) 申请公布日期 2003.04.08
申请号 JP20010303601 申请日期 2001.09.28
申请人 SHIN ETSU HANDOTAI CO LTD 发明人 WATANABE KAZUNORI;HIGUCHI TAKASHI
分类号 B01D53/46;B01D53/18;B01D53/34;B01D53/68;B01D53/77;(IPC1-7):B01D53/46 主分类号 B01D53/46
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