发明名称 MANUFACTURING METHOD OF ELECTRON SOURCE AND IMAGE FORMING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide an electron source which enables to form precise and small electron emitting elements giving an electron beam of a small diameter at high yield, and further to provide an image forming device capable of forming images of fine quality and high precision using the above electron source. SOLUTION: Where there is a short circuit failure 11, a part of a cathode electrode line 52, a repair zone 12, is cut to convert the cathode electrode line 52 to a partially floating state, which leads the direction of the electric field opposite at the electron-emitting part closest to the short circuit failure 52. As a result, electron emission is prevented. Unnecessary electron beam is then avoided, and the specific beam of a desired beam size can be obtained.</p>
申请公布号 JP2003100203(A) 申请公布日期 2003.04.04
申请号 JP20010294928 申请日期 2001.09.26
申请人 CANON INC 发明人 NISHIMURA MICHIYO
分类号 H01J9/50;H01J9/02;H01J31/12;(IPC1-7):H01J9/02 主分类号 H01J9/50
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