| 摘要 |
PROBLEM TO BE SOLVED: To provide a soaking member exhibiting excellent thermal response, its producing method and a heat treatment system of a substrate. SOLUTION: The soaking member, i.e., a soaking ring 34, comprises a first film M1, i.e., a silicon carbide film formed by CVD, a reflective plane R formed on the surface of the first film M1, and a second film M2, i.e., a silicon carbide further film formed on the reflective plane R by CVD. Light incident to the soaking ring 34 is reflected on the reflective plane R formed between both silicon carbide films in the soaking ring 34 and when the light travels to the outside from the second film M2, total reflection of light takes place readily on the boundary plane. Since the transmission light of the soaking ring 4 is reduced and absorbance of light is increased, temperature rises readily and excellent thermal response is ensured.
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