发明名称 POLISHING DEVICE AND METHOD FOR SUPPORT SURFACE FOR FORMING ZEOLITE FILM
摘要 PROBLEM TO BE SOLVED: To provide a polishing device for a support surface for forming a zeolite film capable of promoting the formation of the homogeneous zeolite film by reducing uneven roughness of the support surface. SOLUTION: This device polishes the surface of the porous support used for a film module for separating mixture formed by depositing the zeolite film on the pipe-shaped porous support surface. This device is provided with a support roller 2 rotatably supporting the pipe-shaped porous support 1, a polishing material 3 being in a slide-contact with the outer circumferential surface of the pipe-shaped porous support 1 rotating on the support roller, means 4 pushing the polishing material 3 toward the pipe-shaped porous support 1 and making it to slide in the longitudinal direction of the porous support, and cleaning means 5 cleaning the surface of the porous support 1 in the front and/or the rear in the sliding direction of the polishing material.
申请公布号 JP2003094304(A) 申请公布日期 2003.04.03
申请号 JP20010297152 申请日期 2001.09.27
申请人 MITSUI ENG & SHIPBUILD CO LTD 发明人 YAMAMURA TADASHI;MATSUO YASUO;NAMETAKE TOMOMI;NOBUNAGA HISASHI
分类号 B24B5/50;B01D69/10;B01D71/02;(IPC1-7):B24B5/50 主分类号 B24B5/50
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