Verfahren und System zur Reinigung und Dampftrocknung von Wafern,申请号DE1999183631T-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Verfahren und System zur Reinigung und Dampftrocknung von Wafern
摘要
申请公布号	DE19983631(T1)	申请公布日期	2003.03.27
申请号	DE1999183631T	申请日期	1999.09.28
申请人	SCP GLOBAL TECHNOLOGIES,INC.	发明人	TAMER, ELSAWY;HALL, R. MARK;BUTLER, JOSH
分类号	H01L21/00;(IPC1-7):H01L21/00;F26B21/14	主分类号	H01L21/00
代理机构		代理人
主权项
地址

您可能感兴趣的专利

METHOD AND APPARATUS FOR RECOVERING INFORMATION FROM A VIDEODISC

PROCESS FOR THE PREPARATION OF DIHYDROPYRIDINE DERIVATIVES

A FIXED ANCHOR FOR A STATIONARY NET

A ROLLER DEVICE FOR FISHING NETS

BOTH COLUMN SUPPORTING DEVICE OF SUPPORTING BOARD OF FISHING RODS

MACCHINA PER LA FINITURA ABRASIVA DI PEZZI COME PINZE TRONCHESINI E SIMILI

TONE ADJUSTING DEVICE

ENCLOSED NICKEL-ZINC BATTERY

ELECTROLYTE ADDITIVE FOR LITHIUM-SULFER DIOXIDE BATTERY

EXHAUST GAS REFLUX DEVICE FOR MUTLICYLIDNER ENGINE

METHOD AND DEVICE FOR REMOVING SOLID POWDERED BODY

AUTOMATIC TRANSACTION SYSTEM

OPTICAL FIBER CABLE