| 摘要 |
PURPOSE: To reduce costs for ventilation facility and material for preventing environmental pollution, by supplying an ozonization gas and a photo-resist film removing agent comprising a photo-resist film removing solution from a photo-resist film removing agent supply plate provided counter to a photo- resist film, for removing the photo-resist film. CONSTITUTION: An ozonization gas and a photo-resist film removing solution are supplied toward a substrate 8 from a supply pipe 31 of a photo-resist film removing agent supply plate 30 and a spray hole 33, for contacting to the entire photo-resist film. The photo-resist film on the surface of the substrate 8 which contacted the ozomization gas is acidified and decomposed, for low molecular weight at first. At the same time, a coat of the photo-resist removing solution is formed on the photo-resist film. The photo-resist film of lower molecular weight is dissolved in the photo-resist film removing solution coat, and washed out together with a further supply of solution, so that the photo-resist film is removed from the surface of the substrate 8.
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