Mark configuration, wafer with at least one mark configuration and method for the fabrication of at least one mark configuration

摘要

A mark configuration is provided for the orientation and/or determination of the relative position of a substrate and/or of layers on the substrate during a lithographic exposure, in particular for the case of a wafer during the fabrication of DRAMs. At least one part of a mark is disposed above a patterned background for the purpose of increasing a difference in contrast between the mark and the substrate. A wafer can also be manufactured with such a mark configuration. A method for fabricating the mark configuration is also described. An efficient and simple orientation of layers and/or of the substrate is thus made possible.