发明名称 |
SUBSTRATE PROCESSING APPARATUS |
摘要 |
A substrate processing apparatus comprises roll chucks for holding and rotating a substrate, a closable chamber housing the roll chucks therein, and a gas introduction pipe for introducing a gas into the chamber. The substrate processing apparatus further comprises an etching unit for etching and cleaning a peripheral portion of the substrate while the substrate is being rotated by the roll chucks, and a first supply passage for supplying a first liquid to the etching unit. |
申请公布号 |
WO03023825(A2) |
申请公布日期 |
2003.03.20 |
申请号 |
WO2002JP08924 |
申请日期 |
2002.09.03 |
申请人 |
EBARA CORPORATION |
发明人 |
SAITO, TAKAYUKI;SUZUKI, TSUKURU;MAKITA, YUJI;YAMADA, KAORU;SHIRAKASHI, MITSUHIKO;ITO, KENYA |
分类号 |
C25D17/00;H01L21/00;H01L21/304;H01L21/306 |
主分类号 |
C25D17/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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