CERIUM-BASED POLISHING MATERIAL SLURRY AND METHOD FOR MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a cerium-based polishing material slurry, and a method for manufacturing the same, high in polishing capability and in precision and not leaving grains on the polished surface. SOLUTION: The slurry contains 95 wt.% or more of cerium-based polishing grains on total rare earth oxide (TREO) basis, the grains contain less than 3 wt.% of fluorine relative to TREO, and the grain diameter distribution determined by the laser diffraction method falls in a specified range. The slurry is further improved in adhesiveness when the fluorine rate is decreased to 0.005-0.5 wt.% relative to TREO.