发明名称 MICROMECHANICAL DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a micromechanical device provided with a high performance characteristic by a simple structure and process. SOLUTION: At least a pair of adjacently arranged beams 11 is formed with a predetermined gap on a silicon substrate 10 by surface micromachine technique. Both end parts of the beams 11 are used as anchor parts 12 fixed to the substrate 10, and movable contacts 13 are formed in center parts. Driving electrodes 14 fixed to the substrate 10 are formed concurrently with the beams 11 between the beams 11. By applying a voltage to the driving electrodes 14, the beams 11 arranged on both sides of them are displaced in a direction parallel with the substrate 10, and the movable contacts 13 contact.
申请公布号 JP2003071798(A) 申请公布日期 2003.03.12
申请号 JP20010261999 申请日期 2001.08.30
申请人 TOSHIBA CORP 发明人 FUNAKI HIDEYUKI
分类号 B81B3/00;B81C1/00;G02B26/00;H01H13/80;H01H59/00;H03H3/007;H03H9/24;H03H9/46;(IPC1-7):B81B3/00 主分类号 B81B3/00
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