发明名称 |
DEFECT SHAPE OBSERVING METHOD AND DEFECT INSPECTING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To solve the problem that the precision of the position coordinate of a defect is not good compared with a case when the defect in the substrate where an element pattern is formed is observed, since fine alignment cannot be performed when the defect occurs on the surface of a blank substrate without the element pattern. SOLUTION: The position coordinate of the defect can precisely be decided when the defect occurring on the surface of the blank substrate without the element pattern is observed by forming a mark by a laser marker. The precision of defect position alignment improves and a time required for the observation of the defect can be shortened in SEM observing a defect shape. Consequently, the defect shape can easily be observed.
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申请公布号 |
JP2003068815(A) |
申请公布日期 |
2003.03.07 |
申请号 |
JP20010252929 |
申请日期 |
2001.08.23 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
IKEHATA KOICHI;SAKAMOTO SHINYA |
分类号 |
G01B15/00;H01L21/66;(IPC1-7):H01L21/66 |
主分类号 |
G01B15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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