发明名称 DEFECT SHAPE OBSERVING METHOD AND DEFECT INSPECTING DEVICE
摘要 PROBLEM TO BE SOLVED: To solve the problem that the precision of the position coordinate of a defect is not good compared with a case when the defect in the substrate where an element pattern is formed is observed, since fine alignment cannot be performed when the defect occurs on the surface of a blank substrate without the element pattern. SOLUTION: The position coordinate of the defect can precisely be decided when the defect occurring on the surface of the blank substrate without the element pattern is observed by forming a mark by a laser marker. The precision of defect position alignment improves and a time required for the observation of the defect can be shortened in SEM observing a defect shape. Consequently, the defect shape can easily be observed.
申请公布号 JP2003068815(A) 申请公布日期 2003.03.07
申请号 JP20010252929 申请日期 2001.08.23
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 IKEHATA KOICHI;SAKAMOTO SHINYA
分类号 G01B15/00;H01L21/66;(IPC1-7):H01L21/66 主分类号 G01B15/00
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