发明名称 MULTIBEAM SEMICONDUCTOR LASER ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a multibeam semiconductor laser element where the light output of each beam is uniform and alignment is easy. SOLUTION: The multibeam semiconductor laser element 40 is a GaN-based multibeam semiconductor laser element having four laser stripes 42A to D for emitting laser beams with the same wavelength. Each laser stripe has a p-side common electrode 48 on a mesa 46 formed on a sapphire substrate 44, and has each of active regions 50A to D. Two n-side electrodes 52A and B are provided in a contact layer 54 by the mesa as a common counter electrode opposite to the p-side electrode 48. Distance A between the laser stripes 42A and 42D should be 100μm or less. Distance B1 between the laser stripe 42A and the laser side end section of the n-side electrode 52B should be 150μm or less, and distance B2 between the laser stripe 42D and the laser side end section of the n-side electrode 52B should be 150μm or less.
申请公布号 JP2003069152(A) 申请公布日期 2003.03.07
申请号 JP20020168293 申请日期 2002.06.10
申请人 SONY CORP 发明人 TOJO TAKESHI;HINO TOMOKIMI;ANZAI SHINICHI;GOTO OSAMU;YABUKI YOSHIBUMI;UCHIDA SHIRO;IKEDA MASAO
分类号 H01L21/205;H01S5/22;H01S5/323;(IPC1-7):H01S5/22 主分类号 H01L21/205
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