发明名称 |
LATERAL JUNCTION FIELD-EFFECT TRANSISTOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a lateral J-FET having a structure which can reduce the ON resistance while keeping high breakdown. SOLUTION: The basic structure of this lateral J-FET includes an n-type semiconductor layer 3 consisting of an n-type impurity region, and a p-type semiconductor layer 6 consisting of a p-type impurity region. Furthermore, this p-type semiconductor layer 6 comprises a p<+> -type gate region layer 7 which extends to the n-type semiconductor layer 3 and has a p-type impurity concentration higher than the impurity concentration of the n-type semiconductor layer 3, and an n<+> -type drain region 9 which is arranged keeping a prescribed interval from the p<+> -type gate region layer 7 and has an n-type impurity concentration higher than the impurity concentration of the n-type semiconductor layer 3.
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申请公布号 |
JP2003068762(A) |
申请公布日期 |
2003.03.07 |
申请号 |
JP20010348882 |
申请日期 |
2001.11.14 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
HARADA MAKOTO;HIROTSU KENICHI;MATSUNAMI HIROYUKI;KIMOTO TSUNENOBU |
分类号 |
H01L21/337;H01L29/06;H01L29/10;H01L29/24;H01L29/772;H01L29/808;(IPC1-7):H01L21/337 |
主分类号 |
H01L21/337 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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