| 发明名称 |
TREATING DEVICE USING TREATING GAS, AND METHOD OF OPERATING THE SAME |
| 摘要 |
<p>A treating device(10)includes a treating vessel(11)for effecting a treatment,such as etching,using a treating gas therein,and a gas feeding mechanism(15)for feeding the treating gas into the treating vessel(11).Further,the treating device(10)includes a gas discharging mechanism(14)for discharging the gas after treatment from the treating vessel(11),and a gas circulating mechanism(21)for returning part of the gas being discharged by this gas discharging mechanism(14)into the treating vessel(11).The gas discharging mechanism(14)and gas circulating mechanism(21)are provided with heaters(22A,22B)for heating them to prevent accumulation of impurities.</p> |
| 申请公布号 |
WO03019639(A1) |
申请公布日期 |
2003.03.06 |
| 申请号 |
WO2002JP08829 |
申请日期 |
2002.08.30 |
| 申请人 |
TOKYO ELECTRON LIMITED;NAGASEKI, KAZUYA;HIRAYAMA, YUSUKE |
发明人 |
NAGASEKI, KAZUYA;HIRAYAMA, YUSUKE |
| 分类号 |
B01J19/08;C23F4/00;H01J37/32;H01L21/00;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):H01L21/306 |
主分类号 |
B01J19/08 |
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