发明名称 METHOD AND SYSTEM FOR PRECISELY POSITIONING A WAIST OF A MATERIAL- PROCESSING LASER BEAM TO PROCESS MICROSTRUCTURES WITHIN A LASER- PROCESSING SITE
摘要 A high-speed method and system for precisely positioning a waist of a material-processing laser beam to dynamically compensate for local variations in height of microstructures located on a plurality of objects spaced apart within a laser-processing site are provided. In the preferred embodiment, the microstructures are a plurality of conductive lines formed on a plurality of memory dice of a semiconductor wafer. The system includes a focusing lens subsystem for focusing a laser beam along an optical axis substantially orthogonal to a plane, an x-y stage for moving the wafer in the plane, and a first air bearing sled for moving the focusing lens subsystem along the optical axis.
申请公布号 KR20030017516(A) 申请公布日期 2003.03.03
申请号 KR20027015340 申请日期 2001.05.15
申请人 发明人
分类号 H01L21/301;B23K26/04;B23K26/08;B23K101/40;G03F7/20;H01L21/82 主分类号 H01L21/301
代理机构 代理人
主权项
地址