| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for stably manufacturing a high-density Mg- containing ITO sputtering target at a low cost by which cracking during a manufacturing process can be suppressed and high yield can be attained. SOLUTION: This Mg-containing ITO sputtering target has a composition consisting essentially of In, Sn, Mg and O and can be manufactured by using a method wherein indium oxide powder, tin oxide powder and basic magnesium carbonate powder are mixed or indium oxide - tin oxide powder and basic magnesium carbonate powder are mixed, formed and sintered and the resultant sintered body is subjected to working. |
