METHOD FOR PRODUCING HEXAFLUOROETHANE AND USE THEREOF

摘要

PROBLEM TO BE SOLVED: To provide both a method for producing a high-purity texafluorothane usable as an etching gas or a cleaning gas in a production process for a semiconductor device and the use thereof. SOLUTION: This method for producing the hexafluoroethane comprises steps of reacting a mixed gas containing the hexafluoroethane and chlorotrifluoromethane with hydrogen fluoride in the presence of a fluorinating catalyst in the vapor phase at 200-450 deg.C and fluorinating the chlorotrifluoromethane.