METHOD FOR TRANSFERRING WAFER IN SEMICONDUCTOR DEVICE ION IMPLANTER

摘要

PURPOSE: A method for transferring a wafer in a semiconductor device ion implanter is provided to improve operation efficiency of a transfer robot by performing continuously an unloading process and a loading process. CONSTITUTION: A plurality of wafers(W) are loaded into each loadlock chamber(14a,14b,14c). A plurality of sites(22) are formed on a disc(20). A transfer robot(16) has a robot arm(18) for transferring the wafers(W). The transfer robot(16) performs an unloading process for unloading the processed wafer(W) of the site(22) of the disc(20) into an empty slot of a cassette(C). The transfer robot(16) moves the robot arm(18) to a target wafer of the cassette. The transfer robot(16) performs a loading process for loading target wafers(W) on the sites(22) of the disc(20). A predetermined process is performed by rotating the disc(20) and the next wafer is prepared.